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TiSix as a new embedded material for attenuated phase shift mask

Publication status:
Published

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Publisher copy:
10.1117/12.240969

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Journal:
OPTICAL MICROLITHOGRAPHY IX
Volume:
2726
Pages:
524-530
Publication date:
1996-01-01
Event title:
Conference on Optical Microlithography IX
DOI:
Source identifiers:
24969
ISBN:
0819421022
Keywords:
Pubs id:
pubs:24969
UUID:
uuid:36bccb69-be64-4c3e-a729-c5a92ea2e168
Local pid:
pubs:24969
Deposit date:
2012-12-19

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