Journal article
Cryogenic two-photon laser photolithography with SU-8
- Abstract:
- We have shown that photolithography can be used to create alignment markers on a semiconductor substrate at cryogenic temperatures. The epoxy resist SU-8 can be exposed effectively by two-photon absorption at a temperature of 4 K. By this means a spectroscopy apparatus can be used to find the positions of randomly distributed structures at low temperatures, such as InGaAs/GaAs quantum dots, and mark their positions. We present a systematic study of the optical exposure parameters for cryogenic two-photon laser photolithography with SU-8.
- Publication status:
- Published
- Peer review status:
- Peer reviewed
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(Version of record, pdf, 374.3KB)
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- Publisher copy:
- 10.1063/1.2194311
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Authors
Funding
+ EC-funded Network of Excellence PHOREMOST
More from this funder
Funding agency for:
Sharp, D
Grant:
FP6/2003/IST/2-511616
+ EC-funded Network of Excellence PHOREMOST
More from this funder
Funding agency for:
Turberfield, A
Grant:
FP6/2003/IST/2-511616
Bibliographic Details
- Publisher:
- American Institute of Physics Publisher's website
- Journal:
- Applied Physics Letters Journal website
- Volume:
- 88
- Issue:
- 14
- Pages:
- 143123
- Publication date:
- 2006-04-01
- DOI:
- ISSN:
-
0003-6951
Item Description
- Language:
- English
- Keywords:
- Subjects:
- UUID:
-
uuid:4323c7c0-9bbd-4031-8003-5bd6ddfcd5da
- Local pid:
- ora:983
- Deposit date:
- 2008-03-14
Related Items
Terms of use
- Copyright holder:
- American Institute of Physics
- Copyright date:
- 2006
- Notes:
- Citation: Lee, K. H. et al. (2006). "Cryogenic two-photon laser photolithography with SU-8". Applied Physics Letters [Online], 88 (14), 143123. [Available at http://apl.aip.org/]. Article © 2006 American Institute of Physics.
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