Journal article icon

Journal article

Electron-impact-ionization dynamics of SF6

Abstract:

A detailed understanding of the dissociative electron ionization dynamics of SF6 is important in the modeling and tuning of dry-etching plasmas used in the semiconductor manufacture industry. This paper reports a crossed-beam electron ionization velocity-map imaging study on the dissociative ionization of cold SF6 molecules, providing complete, unbiased kinetic energy distributions for all significant product ions. Analysis of these distributions suggests that fragmentation following single i...

Expand abstract
Publication status:
Published
Peer review status:
Peer reviewed

Actions


Access Document


Files:
Publisher copy:
10.1103/PhysRevA.96.042704

Authors


More by this author
Institution:
University of Oxford
Division:
MPLS Division
Department:
Chemistry; Physical & Theoretical Chem
Role:
Author
More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Chemistry
Sub department:
Physical & Theoretical Chem
Oxford college:
Hertford College
Role:
Author
More from this funder
Grant:
Marie Curie Initial Training Network 238671 “ICONIC,”
More from this funder
Grant:
Starting Independent Researcher Grant No. 200733
Publisher:
American Physical Society Publisher's website
Journal:
Physical Review A Journal website
Volume:
96
Issue:
4
Article number:
042704
Publication date:
2017-10-11
Acceptance date:
2017-09-22
DOI:
EISSN:
2469-9934
ISSN:
2469-9926
Source identifiers:
738302
Pubs id:
pubs:738302
UUID:
uuid:cd1b0eb3-f526-4c9c-85ad-98c87b7e3690
Local pid:
pubs:738302
Deposit date:
2017-10-28

Terms of use


Views and Downloads






If you are the owner of this record, you can report an update to it here: Report update to this record

TO TOP